Exposure apparatus and method of manufacturing device
AssigneeCanon Kabushiki Kaisha
InventorGo Tsuchiya
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Abstract
An exposure apparatus which exposes a substrate to pulsed light supplied from a light source, includes an input device, and a controller configured to periodically change a wavelength of the pulsed light emitted by the light source, wherein the controller is configured to calculate number of pulsed light required to expose each point on the substrate based on a parameter input from the input device, and configured to determine a changing period of the wavelength based on the calculated number.
Claims8
An exposure apparatus for exposing a substrate to pulsed light supplied from a light source, the apparatus comprising:
- an input device;
- and
- a controller configured to periodically change a wavelength of the pulsed light emitted by the light source,
- wherein the controller is configured to calculate number of pulsed light required to expose each point on the substrate based on a parameter input from the input device, and configured to determine a changing period of the wavelength based on the calculated number.
An exposure apparatus for exposing a scanning substrate via a scanning original to slit-shaped exposure light formed from pulsed light supplied from a light source, the apparatus comprising:
- an input device;
- and
- a controller configured to periodically change a wavelength of the pulsed light emitted by the light source,
- wherein the controller is configured to set an oscillation frequency of the light source, a speed of scanning of the substrate, and a width of the slit-shaped exposure light in a direction of the scanning based on a parameter input from the input device, and to determine a changing period of the wavelength based on the set values.
Dependencies are inferred from the claim text.