Active photosensitive structure with buried depletion layer
AssigneeMicron Technology, Inc.
InventorsDmitri Jerdev, Nail Khaliullin
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AssigneeMicron Technology, Inc.
InventorsDmitri Jerdev, Nail Khaliullin
Estimating the term…
An imager pixel has a photosensitive JFET structure having a channel region located above a buried charge accumulation region. The channel region has a resistance characteristic that changes depending on the level of accumulated charge in the accumulation region. During an integration period, incident light causes electrons to be accumulated inside the buried accumulation region. The resistance characteristic of the channel region changes in response to a field created by the charges accumulated in the accumulation region. Thus, when a voltage is applied to one side of the channel, the current read out from the other side is characteristic of the amount of stored charges.
A method of operating a pixel sensor cell comprising:
The method of 1, wherein said step of measuring the resistance comprises obtaining a signal at a second terminal from the channel region and selectively applying said signal to a row select transistor.
A method of operating a photosensor, comprising:
A method of operating a pixel sensor cell, comprising:
A method of operating a pixel sensor cell, comprising:
Dependencies are inferred from the claim text.