Lithographic apparatus, contaminant trap, and device manufacturing method

A lithographic apparatus comprising:

• a radiation system including a radiation source for the production of a radiation beam;
• and
• a contaminant trap arranged in a path of the radiation beam, the contaminant trap comprising a plurality of foils or plates defining channels to substantially transmit said radiation beam, each foil or plate being provided with at least a first section and a second section, the first and second sections of a foil or plate extending in different directions with respect to each other and adjoining each other along an intermediate line, wherein a virtual extension of the intermediate line intersects a center of the radiation source.

A device manufacturing method comprising:

• projecting a patterned beam of radiation onto a substrate;
• and
• injecting gas directly into at least at two different positions of at least one channel of a foil or plate of a contaminant trap.