Film forming composition, insulating film formed by use of the composition, and electronic device

A compound represented by formula (I):

• wherein R1, R2 and R3 each independently represents an ethynyl group;
• X1, X2 and X3 each independently represents a hydrogen atom or a linear or branched C1-10 alkyl group;
• l and n each independently represents 0 or 1 with the proviso that l and n do not represent 0 simultaneously;
• m represents 0 , with the proviso that l, m and n do not represent 0 simultaneously;
• o, p, and q each independently stands for an integer of from 0 to 2;
• and
• r represents 1.

A polymer obtained by polymerizing a compound represented by formula (I):

• wherein R1, R2 and R3 each independently represents an ethynyl group;
• X1, X2 and X3 each independently represents a hydrogen atom or a linear or branched C1-10 alkyl group;
• l and n each independently represents 0 or 1 with the proviso that l and n do not represent 0 simultaneously;
• m represents 0, with the proviso that l, m and n do not represent 0 simultaneously;
• o, p, and q each independently stands for an integer of from 0 to 2;
• and
• r represents 1.