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AssigneeSumitomo Bakelite Co., Ltd.
InventorsLarry F. Rhodes, Richard Vicari, Leah J. Langsdorf, Andrew A. Sobek, Edwin P. Boyd, Brian Bennett
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The present invention relates to polycyclic polymers, methods for producing polycyclic polymers, and methods for their use as photoresists in the manufacture of integrated circuits. In one embodiment, the present invention relates to photoresist compositions formed from the polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer. In another embodiment, the present invention relates to photoresist compositions formed from the co-polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer with at least one non-halogenated polycyclic monomer.
A polycyclic addition polymer comprising a hydrogenated olefinic end group, a hydrosilated olefinic end group or a hydroformylated olefinic end group on one or both terminal ends thereof.
Dependencies are inferred from the claim text.