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AssigneeThe United States of America as represented by the Director, National Security Agency
InventorsJohn L. Fitz, Daniel S. Hinkel, Scott C. Horst
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The present invention is a method of fabricating a waveguide using a sacrificial spacer layer. The first step in this process is to fabricate the underlying optical semiconductor structure. A trench is then etched in this structure resulting in an underlying L-shaped structure. A sacrificial spacer layer is deposited in the trench. The waveguide is created in the trench on the sacrificial spacer layer using a mask layer to angle the vertex of the L-shaped structure. User-defined portions of the sacrificial spacer layer are subsequently removed to create air gaps between the waveguide and the sidewalls of the trench in the optical semiconductor.
A method for creating an optical semiconductor device comprising the steps of:
Dependencies are inferred from the claim text.