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US 7,611,828 B2Granted
Photoactive adhesion promoter
OwnerRobert P. Meagleyinventor
Life of this patent
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Abstract
An adhesion promoter to help reduce semiconductor process effects, such as undesired line edge roughness, insufficient lithographical resolution, and limited depth of focus problems associated with the removal of a photoresist layer. A photoactive adhesion promoter (PAG) is described which helps reduce these and other undesired effects associated with the removal of photoresist in a semiconductor manufacturing process.
Claims15
A photoactive adhesion promoter comprising:
- an adhesion promoter;
- and
- a photoacid generator linked to the adhesion promoter by a non-cyclic organic chain.
A method of creating a photoactive adhesion promoter comprising:
- forming alkylsiloxane by combining bromomagnesiummethylphenylphenylsulfide and trimethoxysilylchloride;
- and
- treating the alkylsiloxane with methyliodide to form a sulfonium siloxane species.
Dependencies are inferred from the claim text.