Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same

A method of forming a double-layer pattern for display devices, the method comprising:

• coating a photosensitive resin composition on a substrate to form a coating layer, the photosensitive resin compositing containing a lower layer hardener capable of hardening a lower portion of the coating layer;
• exposing light to the coating layer through a photomask having a slit pattern so as to cause unsaturated light-exposure through the slit pattern;
• and
• developing the light-exposed coating layer, wherein an upper portion of the coating layer is removed due to the unsaturated light-exposure and the lower portion of the coating layer hardened by the lower layer hardener remains, thereby differentiating the thickness of the developed coating layer to have a γ-value of not more than 2.5 after development.