US 7,611,820 B2Granted

Positive resist composition and pattern-forming method using the same

AssigneeFUJIFILM Corporation

InventorsHiromi Kanda, Shinichi Kanna, Haruki Inabe

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Abstract

A positive resist composition comprises: (A) a resin capable of increasing its solubility in an alkali developer by action of an acid and not containing a silicon atom; (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, (C) a silicon atom-containing resin having at least one group selected from groups (X) to (Z), (X) an alkali-soluble group, (Y) a group capable of decomposing by action of an alkali developer to increase the solubility of resin (C) in an alkali developer, (Z) a group capable of decomposing by action of an acid to increase the solubility of resin (C) in an alkali developer; and (D) a solvent.

Claims12

Dependent claims

A positive resist composition containing:

(A) a resin capable of increasing its solubility in an alkali developer by action of an acid and not containing a silicon atom;
(B) a compound capable of generating an acid upon irradiation with actinic ray or radiation,
(C) from 0.1 to 5 mass % of a total solids content in the composition of a silicon atom-containing resin having at least one group selected from groups (X) to (Z),
(X) an alkali-soluble group,
(Y) a group capable of decomposing by action of an alkali developer to increase the solubility of resin (C) in an alkali developer,
(Z) a group capable of decomposing by action of an acid to increase the solubility of resin (C) in an alkali developer;
and
(D) a solvent.

5 more elements

Dependencies are inferred from the claim text.

Facts

Application: 11/519,966Filed 13 Sep 2006
Priority: JP P.2005-26575013 Sep 2005
Published: US 2007/0059639 A115 Mar 2007
Granted: 3 Nov 2009
Term ends: Not estimatedThe source records don’t support an estimate.

Classification9 codes

G03F 7/0758
Macromolecular compounds containing Si-O, Si-C or Si-N bonds: with silicon- containing groups in the side chains
G03F 7/0395
The macromolecular compound being present in a chemically amplified positive photoresist composition: the macromolecular compound having a…
G03F 7/0397
The macromolecular compound being present in a chemically amplified positive photoresist composition: the macromolecular compound having an…
G03F 7/0757
Silicon-containing compounds: macromolecular compounds containing Si-O, Si-C or Si-N bonds

Family

US 2007/0059639 A1Pre-grant publication · published 15 Mar 2007
US 7,611,820 B2This patent

From the US filing history. Foreign family members aren’t listed.

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