Resist composition, method for forming resist pattern, and semiconductor device and method for manufacturing the same

A method for forming a resist pattern comprising:

• forming a resist pattern on a surface of a workpiece to be processed by using a resist composition;
• and
• applying a resist pattern thickening material on the surface of the workpiece so as to cover the surface of the resist pattern,
• wherein the resist composition comprises at least an alicyclic compound and a resin, wherein the alicyclic compound is at least any one of adamantane compounds and norbornane compounds, wherein the adamantane compounds are represented by the following Structural Formulae (1) to (5), and the norbornane compounds are represented by the following Structural Formulae (6) to (8), and
• wherein the resist composition does not comprise water

A method for manufacturing a semiconductor device comprising:

• forming a resist pattern on a surface of a workpiece to be processed by using a resist composition, and by applying a resist pattern thickening material over the surface of the workpiece so as to cover the surface of the resist pattern to thereby thicken the resist pattern;
• and
• patterning the surface of the workpiece by etching the surface of the workpiece using the thickened resist pattern as a mask,
• wherein the resist composition comprises an alicyclic compound and a resin, wherein the alicyclic compound is at least any one of adamantane compounds and norbornane compounds, wherein the adamantane compounds are represented by the following Structural Formulae (1) to (5), and the norbornane compounds are represented by the following Structural Formulae (6) to (8),and
• wherein the resist composition does not comprise water