Methods of spin-on wafer cleaning
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsJun Wu, Dong-Xuan Lu, Shih-Chi Lin, Wen-Long Lee, Yi-An Jian, Guang-Cheng Wang, Shiu-Ko JangJian, Chyi-Tsong Ni, Szu-An Wu, Ying-Lang Wang
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Abstract
A method for spin-on wafer cleaning. The method comprises controlling spin speed and vertical water jet pressure. The vertical jet pressure and the spin speed are substantially maintained in inverse proportion. Wafer spin speed is between 50 to 1200 rpm. Vertical wafer jet pressure is between 0.05 to 100 KPa.
Claims14
A spin clean method, comprising:
- providing a pressurized cleaning liquid onto a wafer while spinning the wafer;
- maintaining the product of the substantially vertical jet pressure on the wafer and wafer spin speed in a constant;
- and
- changing substantially vertical jet pressure on the wafer and wafer spin speed in inverse proportion relationship.
A spin clean method for removing particles from a wafer, the method comprising:
- positioning a wafer onto a chuck, the wafer having a plurality of particles thereon;
- providing a pressurized cleaning liquid onto the wafer from a nozzle positioned above the wafer;
- spinning the chuck about an axis to remove the particles;
- maintaining the product of the substantially vertical jet pressure on the wafer and wafer spin speed in a constant;
- and
- changing substantially vertical jet pressure on the wafer and wafer spin speed in inverse proportion relationship.
A spin clean method for removing particles from a wafer, the method comprising:
- positioning a wafer onto a chuck, the wafer having a plurality of particles thereon;
- providing pressurized cleaning liquid onto the wafer from a nozzle positioned above the wafer;
- spinning the chuck about an axis to remove the particles;
- and
- changing vertical jet pressure on the wafer and wafer spin speed in inverse proportional relationship;
- and
- maintaining the product of the substantially vertical jet pressure on the wafer and wafer spin speed in a constant according to the equation:
- Jet pressure (KPa)*spin speed (rpm)≦12000 KPa*rpm.
Dependencies are inferred from the claim text.