Mask overlay for infrared target assembly
AssigneeHubbs Machine & Manufacturing, Inc.
InventorWilliam O. Hubbs
Life of this patent
Estimating the term…
Abstract
An infrared target for use with indoor industrial G.P.S. has at least one mask or overlay applied to the lens of the target. The mask increases the precision of setting the location of any instrument, assembly, machinery, or component to be machined, during industrial applications. The mask improves position tolerances to 0.0005 inch or less. Further, a reflective ring positioned upon the overlay serves as a marker for laser light at lesser tolerance than the overlay.
Claims7
An improvement to an infrared target assembly used in industrial surveying, the assembly including a body having an axial centerline with a detector beneath a lens within said body, said improvement comprising:
- an overlay opaque to visible light and infrared radiation, having a central round hole, and centerline, for admitting infrared radiation and a precise location upon the lens and within the assembly thus locating the centerline of the overlay within a tolerance of 0.0005 inches or less of the centerline of the body, said overlay and said target assembly operating at approximately room temperature;
- and
- a reflective ring, having a central round hole of greater diameter than the central hole of said overlay and for admitting laser radiation, said ring located upon said overlay and abutting said assembly, and said reflective ring reflecting radiation outward from said assembly.
Dependencies are inferred from the claim text.