Structure for supporting sample to be subjected to surface enhanced vibrational spectroscopic analysis and method of manufacturing the same
AssigneeCanon Kabushiki Kaisha
InventorKaoru Konakahara
Life of this patent
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Abstract
A structure for supporting a sample to be subjected to a surface enhanced vibrational spectroscopic analysis includes a substrate, a ground film formed on the substrate, and a base formed on the ground film. The base includes a plurality of holes formed in a direction perpendicular to the substrate. Metal fine particles are exposed on inner surfaces of the holes formed in the base and on a surface of the base.
Claims14
A structure for supporting a sample to be subjected to surface enhanced vibrational spectroscopic analysis, comprising:
- a substrate;
- a ground film formed on the substrate;
- and
- a base formed on the ground film,
- wherein the base includes a plurality of holes formed in a direction perpendicular to the substrate and metal fine particles are exposed on inner surfaces of the holes formed in the base and on a surface of the base,
- wherein the base is one of:
- a film in which a layer including metal fine particles and an Al layer are alternately layered;
- a film in which a layer including metal fine particles and an Si layer are alternately layered;
- an Si layer in which metal fine particles are dispersed;
- and
- a film in which a mixed layer including Al and at least one of Si and Ge and a layer including metal fine particles are alternately layered.
A method of manufacturing a structure for supporting a sample to be subjected to surface enhanced vibrational spectroscopic analysis, at least comprising the steps of:
- forming a ground film on a substrate;
- forming, as a base, a film including metal fine particles on the ground film;
- and
- forming a plurality of holes in the base in a direction perpendicular to the substrate;
- wherein the metal fine particles are exposed on inner surfaces of the holes formed in the base and on a surface of the base by the step of forming the film and the step of forming the holes,
- wherein the base is one of:
- a film in which a layer including metal fine particles and an Al layer are alternately layered;
- a film in which a layer including metal fine particles and an Si layer are alternately layered;
- an Si layer in which metal fine particles are dispersed;
- and
- a film in which a mixed layer including Al and at least one of Si and Ge and a layer including metal fine particles are alternately layered.
Dependencies are inferred from the claim text.