Semiconductor device and method for manufacturing the same
AssigneeHynix Semiconductor Inc.
InventorsSang Don Lee, Yil Wook Kim, Jin Hong Ahn
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Abstract
The present invention discloses improved semiconductor device and method for manufacturing wherein one side of a source and drain region and a portion of a channel region are disposed on a buried oxide layer formed on a semiconductor substrate and the side of the source and drain region and another portion of the channel region are disposed on a Si epitaxial layer formed on a semiconductor substrate.
Claims4
A semiconductor device, comprising:
- a semiconductor substrate having an active region defined by a device isolation film;
- a gate structure having a first side and a second side, the gate structure comprising a stacked structure of a gate insulating film, a gate electrode and a first CVD insulating film;
- a first sidewall spacer and a second sidewall spacer respectively disposed on the first side and the second side of the gate structure;
- an LDD region disposed in a first Si epitaxial layer under the gate insulating film;
- a second Si epitaxial layer and a buried oxide film disposed under the LDD region and the first Si epitaxial layer, wherein the second Si epitaxial layer is disposed adjacent to the buried oxide film, the buried oxide film filling a recess disposed on a surface of the semiconductor substrate adjacent to the second sidewall spacer;
- and
- a source/drain region disposed on the second Si epitaxial layer and the buried oxide film.
A semiconductor device comprising a gate insulating film, a gate electrode, first and second sidewall spacers disposed at opposite sides of the gate electrode, a channel region, an LDD region and a source/drain region disposed at both sides of the LDD region, the semiconductor device further comprising:
- a second Si epitaxial layer disposed under the channel region extending to the source/drain region in a first direction;
- and
- a buried oxide film disposed adjacent to the second Si epitaxial layer and disposed under the channel region extending to the source/drain region in a second direction opposite to the first direction, wherein the buried oxide film fills a recess disposed on a surface of the semiconductor substrate adjacent to the second sidewall spacer.
Dependencies are inferred from the claim text.