Extreme ultra violet light source device
AssigneesKomatsu Ltd., Gigaphoton Inc.
InventorMasaki Nakano
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AssigneesKomatsu Ltd., Gigaphoton Inc.
InventorMasaki Nakano
Estimating the term…
An EUV (extreme ultra violet) light source device in which a degree of vacuum or cleanness in a plasma generation chamber is improved while the construction is simplified. The device includes a first chamber; a second chamber connected to the first chamber through an opening portion; a target supplier that supplies a target material into the first chamber; a droplet generating unit that generates droplets of the target material of molten metal repetitively dropping based on the target material supplied by the target supplier; a blocking unit that prevents the droplets of the target material generated by the droplet generating unit from passing through the opening portion; control unit that controls the blocking unit to operate at predetermined timing; a laser light source; and an optical system that leads a laser beam to the droplets of the target material introduced into the second chamber.
An extreme ultra violet light source device for generating extreme ultra violet light by irradiating a target material with a laser beam emitted from a laser light source to turn the target material into a plasma state, said device comprising:
An extreme ultra violet light source device for generating extreme ultra violet light by irradiating a target material with a laser beam emitted from a laser light source to turn the target material into a plasma state, said device comprising:
An extreme ultra violet light source device for generating extreme ultra violet light by irradiating a target material with a laser beam emitted from a laser light source to turn the target material into a plasma state, said device comprising:
An extreme ultra violet light source device for generating extreme ultra violet light by irradiating a target material with a laser beam emitted from a laser light source to turn the target material into a plasma state, said device comprising:
An extreme ultra violet light source device for generating extreme ultra violet light by irradiating a target material with a laser beam emitted from a laser light source to turn the target material into a plasma state, said device comprising:
An extreme ultra violet light source device for generating extreme ultra violet light by irradiating a target material with a laser beam emitted from a laser light source to turn the target material into a plasma state, said device comprising:
Dependencies are inferred from the claim text.