Methods and systems for decreasing the effective pulse repetition of a laser
AssigneeElectro Scientific Industries, Inc.
InventorsKelly Bruland, Steve Swaringen, Steve Stone, Keith Grant
Life of this patent
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AssigneeElectro Scientific Industries, Inc.
InventorsKelly Bruland, Steve Swaringen, Steve Stone, Keith Grant
Estimating the term…
A method selectively processes structures on a workpiece with laser pulses. The structures are arranged in a linear pattern having approximately equal pitch. The pulses propagate along a laser beam propagation path terminating at a laser beam spot on the workpiece. The method fires a first processing pulse when the spot coincides with a first structure location, selectively blocks or clears the propagation path during the first pulse, moves the workpiece and the spot relative to one another such that the spot moves toward a second structure location at a speed less than the product of the laser's PRF and the pitch, fires a dummy pulse before the spot reaches the second structure location, blocks the propagation path during the dummy laser pulse, fires another processing pulse when the beam spot coincides with the second structure location, and selectively blocks or clears the propagation path during the second processing pulse.
A method for selectively processing one or more of a set of structures on or within a workpiece by irradiating selected structures in the set with pulses from a laser, the set of structures being arranged on the workpiece in a linear pattern having an approximately equal pitch between adjacent structures, the pulses propagating along a laser beam propagation path terminating at a laser beam spot on the workpiece, the laser being characterized by a PRF parameter that specifies a PRF at which pulses produced by the laser have desirable pulse properties for processing the structures, the method comprising:
A system for operating a machine having a laser characterized by a PRF parameter that specifies a PRF at which pulses produced by the laser have desirable pulse properties for irradiating structures on or within a workpiece for a given purpose, the structures being arranged in on the workpiece a linear pattern having an approximately equal pitch between adjacent structures, the laser emitting a laser pulse that propagates along a laser beam propagation path terminating at a laser beam spot on the workpiece, the machine being capable of moving the workpiece and the laser beam spot relative to one another at a maximum speed that is less than the product of the PRF parameter and the pitch, the machine being effective to move the laser beam spot across the structures along the linear pattern to selectively irradiate selected ones of the structures with the laser without substantially degrading the desirable pulse properties, the system comprising:
A system for irradiating selected targets in a series of structures on or within a workpiece, the series of structures being arranged on the workpiece in a linear pattern having an approximately equal pitch between adjacent structures, the system comprising:
Dependencies are inferred from the claim text.