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US 7,608,547 B2Granted
Etchant and method for fabricating liquid crystal display using the same
AssigneeSamsung Electronics Co., Ltd.
InventorsHong-sick Park, Shi-yul Kim, Jong-hyun Choung, Won-suk Shin
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Abstract
Provided are an etchant used for a transparent conductive oxide layer and a method for fabricating a liquid crystal display (LCD) using the etchant. The etchant includes 2-5 wt % sulfuric acid, 0.02-10 wt % hydrogen sulfate of alkali metal, and deionized water as the remainder.
Claims27
An etchant for a transparent conductive oxide layer comprising:
- 2-15 wt % sulfuric acid;
- 0.02-10 wt % hydrogen sulfate of an alkali metal;
- and deionized water as the remainder,
- wherein the transparent conductive oxide layer is made of indium tin oxide (ITO) or indium zinc oxide (IZO).
1 more element
An etchant for a transparent conductive oxide layer, comprising:
- 2-15 wt % sulfuric acid;
- 0.02-10 wt % hydrogen sulfate of alkali metal;
- a 0.02-10 wt % auxiliary oxidizer;
- a 0.01-5 wt % auxiliary inhibitor;
- and
- deionized water as the remainder,
- wherein the transparent conductive oxide layer is made of indium tin oxide (ITO) or indium zinc oxide (IZO).
4 more elements
Dependencies are inferred from the claim text.