Method of forming fine pattern, liquid crystal display device having a fine pattern and fabricating method thereof

A method of forming a fine pattern, comprising:

• forming a photo-resist pattern using a mask to form a first pattern having a first line width corresponding to an exposure resolution of the mask;
• ashing the photo-resist pattern to have a second pattern with a second line width narrower than the first line width, wherein the ashing process is performed by O2 and at least one of SF6 and CF4 gas environment;
• and
• patterning a film by using the ashed photo-resist pattern as a mask to form a third pattern with a third line width narrower than the second line width.

A method of fabricating at least one portion of the pixel electrode and the common electrode on a substrate for a liquid crystal display device comprising:

• forming a conductive layer;
• forming a photo-resist pattern using a mask to form a first pattern having a first line width corresponding to an exposure resolution of the mask;
• ashing the photo-resist pattern, wherein the ashing process is performed under O2 and at least one of SF6 and CF4 gas environment;
• and
• patterning the conductive layer using the ashed photo-resist pattern as a mask to form the one portion having a second line width narrower than the first line width.