Method for selective laser crystallization and display panel fabricated by using the same
AssigneeAu Optronics Corporation
InventorsTsung-Yi Hsu, Chih-Hsiung Chang
Life of this patent
Estimating the term…
Abstract
A display panel comprises a substrate having a displaying region (such as active organic light emitting region) and a circuit driving region; and a polysilicon layer formed on the substrate and having a first polysilicon portion and a second polysilicon portion respectively corresponding to the displaying region and circuit driving region, wherein the grain size of the second polysilicon portion crystallized by continuous wave (CW) laser annealing method is larger than that of the first polysilicon portion crystallized by excimer laser annealing (ELA) method.
Claims9
A method for fabricating a display panel, comprising:
- providing a substrate having a displaying region and a circuit driving region;
- depositing an amorphous silicon layer on the substrate, and the amorphous silicon layer having a first amorphous silicon portion and a second amorphous silicon portion respectively associated to the displaying region and the circuit driving region;
- crystallizing only the second amorphous silicon portion by a continuous wave laser beam to form a second polysilicon portion;
- and
- crystallizing the first amorphous silicon portion excluding the second amorphous silicon portion to form a first polysilicon portion, wherein the crystallizing methods applied to the first amorphous silicon portion and the second amorphous silicon portion are different.
Dependencies are inferred from the claim text.