Substrate cover, and charged particle beam writing apparatus and method
AssigneeNuFlare Technology, Inc.
InventorYuichi Tachikawa
Life of this patent
Estimating the term…
Abstract
A substrate cover includes a frame-like member configured to be placed on a substrate which is to be written using a charged particle beam, and to have an outer perimeter dimension larger than a perimeter end of the substrate and an inner perimeter dimension, being a border between the frame-like member and an inner opening portion, smaller than the perimeter end of the substrate, and a contact point part configured to be provided on an undersurface of the frame-like member, in order to be electrically connected to the substrate.
Claims10
A substrate cover comprising:
- a frame-like member configured to be placed on a substrate which is to be written using a charged particle beam, and to have an outer perimeter dimension larger than a perimeter end of the substrate and an inner perimeter dimension, being a border between the frame-like member and an inner opening portion, smaller than the perimeter end of the substrate;
- and
- a contact point part configured to be provided on an undersurface of the frame-like member, in order to be electrically connected to the substrate.
A charged particle beam writing apparatus comprising:
- a stage configured to hold thereon a substrate attached with a substrate cover covering a whole perimeter part of the substrate and including a contact point electrically connected to the substrate;
- an electric conductive member configured to be electrically connected to the contact point and couple the substrate charged to ground potential, in a state that the substrate is arranged on the stage;
- and
- a writing unit configured to write a predetermined pattern onto the substrate by using a charged particle beam, in a state that the substrate is coupled to ground potential by using the electric conductive member.
A charged particle beam writing method comprising:
- carrying a substrate attached with a substrate cover with a predetermined mark formed thereon into a pattern writing apparatus;
- checking a position of the substrate by using the predetermined mark formed on the substrate cover;
- and
- writing a predetermined pattern on the substrate whose position has been checked, by using a charged particle beam.
A charged particle beam writing method comprising:
- carrying a substrate attached with a substrate cover that covers a whole perimeter part of the substrate into a pattern writing apparatus;
- and
- writing a predetermined pattern on the substrate attached with the substrate cover, by using a charged particle beam.
Dependencies are inferred from the claim text.