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US 7,608,474 B2Granted
Method for manufacturing optical element
AssigneeSeiko Epson Corporation
InventorsYoshitomo Kumai, Daisuke Sawaki
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Abstract
A method for manufacturing an optical element having a metal wire grid containing a plurality of metal wires on a substrate includes forming the metal wire grid using an electrolytic plating process.
Claims2
A method for manufacturing an optical element, comprising:
- forming plural linear resist films arranged at equal intervals on a transparent electrode layer formed on a glass substrate;
- performing a process of forming a first metal layer made of a first metal by an electrolytic plating process and then forming a second metal layer made of a second metal by an electrolytic plating process or non-electrolytic plating process, thereby forming the first metal and second metal alternately on each other between the resist films;
- and
- removing the resist films to leave a wire grid in which the first metal and second metal are alternately formed,
- wherein the first metal is a different metal than the second metal, and
- wherein the process of forming the first metal layer and then forming the second metal layer is performed at least twice until a configuration having a desired number of the first and second metal layers is obtained.
3 more elements
Dependencies are inferred from the claim text.