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US 7,608,470 B2Granted
Interconnection device including one or more embedded vias and method of producing the same
AssigneeIntel Corporation
InventorsAlexander Talalaevski, Eyal Bar-Sadeh, Shlomy Tubul
Life of this patent
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Abstract
“An interconnection device comprises a Systems In Package (SIP) device, or Systems in Chip (SIC) device, including one or more embedded vias extending through a base substrate. A process to produce the interconnection device.”
Claims4
A process comprising:
- forming at least one inter-layer-dielectric section within a base substrate,
- forming one or more embedded vias in said base substrate and in direct contact with said inter-layer dielectric section;
- and
- attaching one or more electronic components to said base substrate before forming said vias.
1 more element
Dependencies are inferred from the claim text.