Loading patent…
AssigneesNational Centre for Scientific Research Demokritos, Panagiotis Argitis, Konstantinos Misiakos, Sotirios E. Kakabakos
InventorsPanagiotis Argitis, Konstantinos Misiakos, Sotirios E. Kakabakos, Constantinos D. Diakoumakos
Estimating the term…
Novel photoresist materials, which can be photolithographically processed in biocompatible conditions are presented in this invention. Suitable lithographic scheme for the use of these and analogous resists for biomolecule layer patterning on solid substrates are also described. The processes described enable micropatterning of more than two different proteins on solid substrates without denaturation of the proteins. The preferred resist materials are based on (meth)acrylate copolymers that contain at least one acid cleavable ester group and at least one hydrophilic group such as an alcoholic or a carboxylic group.
A kit of photolithographic processing reagents comprising:
Method of photolithographic processing using photoresist comprising a copolymer synthesized from monomers, wherein at least one of said monomers contains an acid cleavable group and at least one of said monomers contains a hydrophilic group selected from the class of hydroxyls and carboxyls, comprising the steps of exposure of selected photoresist areas, dissolution of said photoresist areas and deposition of biomolecules on the substrate, wherein the step of dissolution is accomplished using dilute aqueous base developer that is less than 0.01 N base concentration and wherein exposure of selected photoresist areas and the subsequent dissolution of said photoresist areas follows the deposition of biomolecules on the substrate without deactivating the deposited biomolecules.
Method of photolithographic processing using photoresist comprising a copolymer synthesized from monomers of 2-hydroxyethyl- methacrylate, isobornyl-methacrylate, t-butylmethacrylate, and acrylic acid, wherein the method comprises the steps of exposure of selected photoresist areas, dissolution of said photoresist areas and deposition of biomolecules on the substrate.
Photoresist in contact with a developer wherein said photoresist comprises a copolymer synthesized from monomers, wherein at least one of said monomers is 2-hydroxyethyl-methacrylate and wherein at least one of said monomers contains an acid cleavable group and at least one of said monomers contains a hydrophilic group selected from the class of hydroxyls and carboxyls;
The photoresist comprising a copolymer synthesized from monomers of 2-hydroxyethyl-methacrylate, isobornyl-methacrylate, t-butylmethacrylate, and acrylic acid wherein the proportion of 2-hydroxyethyl-methacrylate/isobornyl- ethacrylate/t-butylmethacrylate/acrylic acid is 30/40/20/10 by weight.
Dependencies are inferred from the claim text.