Polymer compound, positive resist composition and process for forming resist pattern
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsYohei Kinoshita, Takeshi Iwai
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AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsYohei Kinoshita, Takeshi Iwai
Estimating the term…
The positive resist composition of the present invention is a polymer compound comprising at least one constituent unit (a1) selected from the group consisting of constituent units represented by the following general formulas (1) and (1)′, a constituent unit (a2) derived from an (α-lower alkyl)acrylate ester having a lactone-containing monocycle or a polycyclic group, and a constituent unit (a3) which is a constituent unit other than the constituent unit (a1) and the constituent unit (a2) and is derived from an (α-lower alkyl)acrylate ester which has an aliphatic cyclic group-containing non-acid dissociable dissolution inhibiting group and does not have a polar group: wherein R represents a hydrogen atom, a fluorine atom, a lower alkyl group having 20 or less carbon atoms, or a fluorinated lower alkyl group having 20 or less carbon atoms, R1 represents at most 20-membered cyclic group which may have a substituent, n represents 0 or an integer of 1 to 5, and m represents 0 or 1.
A polymer compound comprising:
A polymer compound comprising:
A polymer compound comprising:
Dependencies are inferred from the claim text.