Substrate processing apparatus and method
AssigneeDainippon Screen Mfg. Co., Ltd.
InventorsKatsuhiko Miya, Koji Ando
Life of this patent
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AssigneeDainippon Screen Mfg. Co., Ltd.
InventorsKatsuhiko Miya, Koji Ando
Estimating the term…
In the vicinity of a rim portion of a spin base 5, a plurality of supports 7 which abut on a bottom rim portion of a substrate W and support the substrate W are formed projecting toward above from the spin base 5. The substrate W is supported horizontally by the plurality of supports 7, with a predetermined distance ensured from the spin base 5 which opposes the bottom surface of the substrate W. Into the space which is created between the top surface of the substrate W and an opposing surface 9a of an atmosphere blocker plate 9, inert gas is ejected from a plurality of gas ejection outlets 9b which are formed in the opposing surface 9a. The inert gas thus supplied to the top surface of the substrate W presses the substrate W against the supports 7 and the substrate W is held at the spin base 5.
A substrate processing apparatus which performs predetermined processing by supplying a processing liquid to a substrate while rotating said substrate, comprising:
A substrate processing method in which predetermined processing is performed by supplying a processing liquid to a substrate while rotating said substrate, said method comprising steps of:
A substrate processing apparatus which performs predetermined processing by supplying a processing liquid to a substrate while rotating said substrate, comprising:
Dependencies are inferred from the claim text.