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US 7,607,213 B2Granted
Method of making a device for measuring deformation
AssigneeSnecma
InventorsPierre Bertrand, Christian Coddet, Sophie Costil, Frederic Leman, Sebastien Lukat
Life of this patent
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Abstract
A method of making a device for measuring deformation includes a step of depositing a silicon adhesion underlayer on a silicon carbide surface by chemical vapor spraying, and a step of depositing a coating on the silicon adhesion underlayer by atmospheric thermal spraying.
Claims4
A method of making a device for measuring deformation, the method comprising the following steps:
- a) depositing, on a silicon carbide surface of a part constituted by a substrate covered in a silicon carbide layer deposited by chemical vapor deposition, a silicon adhesion underlayer by vacuum plasma spraying;
- b) depositing on said silicon adhesion underlayer an alumina coating by atmospheric thermal spraying;
- c) placing a free filament strain gauge on said coating, the gauge being held on a support, and said support possessing openings;
- d) depositing a second alumina coating on said strain gauge and on said coating by atmospheric thermal spraying through said openings;
- e) removing said support;
- and
- f) depositing a third alumina coating by atmospheric thermal spraying on said first coating, on said second coating, and on said strain gauge.
4 more elements
Dependencies are inferred from the claim text.