Light exposure apparatus

An apparatus for fabricating a substrate, comprising:

• a chuck adapted to receive the substrate on a surface thereof;
• a plurality of first lift pins in the chuck to move up and down to load/unload the substrate on/from the surface of the chuck, the plurality of first lift pins symmetrically arranged in a center portion of the chuck;
• and
• a plurality of second lift pins in the chuck to discharge electrostatic charges of the chuck and the substrate, wherein each of the plurality of second lift pins includes a plate contacting the substrate, a supporter supporting and contacting a lower surface of the plate, and an elastic body contacting a lower surface of the supporter to elastically move up and down each of the plurality of second lift pins, and wherein the plate has a first diameter and the supporter has a second diameter smaller than the first diameter,
• wherein a burden of the plurality of first lift pins is reduced such that the plurality of second lift pins take a part of a weight of the substrate when the substrate is loaded on the chuck and raise the substrate when the substrate is unloaded from the chuck and wherein an up position of the plurality of first lift pins is higher than an up position of the second lift pins and a down position of the plurality of first lift pins is the same as a down position of the plurality of second lift pins.

A light exposure apparatus for fabricating a substrate of a liquid crystal panel, comprising:

• a light source adapted to emit ultra-violet light;
• a photo mask including predetermined patterns that selectively transmit and block the light emitted from the light source;
• a chuck adapted to support the substrate that is exposed to the light through the photo mask;
• a plurality of first lift pins in the chuck that are able to move up and down to load/unload the substrate on/from the chuck, the plurality of first lift pins symmetrically arranged in a center portion of the chuck;
• a plurality of second lift pins in the chuck to discharge electrostatic charges of the chuck and the substrate, wherein each of the plurality of second lift pins includes a plate contacting the substrate, a supporter supporting and contacting a lower surface of the plate, and an elastic body contacting a lower surface of the supporter to elastically move up and down each of the plurality of second lift pins, and wherein the plate has a first diameter and the supporter has a second diameter smaller than the first diameter,
• wherein a burden of the plurality of first lift pins is reduced such that the plurality of second lift pins take a part of a weight of the substrate when the substrate is loaded on the chuck and raise the substrate when the substrate is unloaded from the chuck, and wherein an up position of the plurality of first lift pins is higher than an up position of the second lift pins and a down position of the plurality of first lift pins is the same as a down position of the plurality of second lift pins.