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US 7,604,905 B2Granted
Photomasks
AssigneeDongbu Electronics Co., Ltd.
InventorHong Lae Kim
Life of this patent
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Abstract
Photomasks are disclosed. A disclosed example photomask comprises: a first pattern located along an axis of the photomask; at least one second pattern located a distance from and a predetermined angle to the first pattern; and slits made of Cr on at least one end of each of the first and second patterns, wherein the photomask is a Cr-less mask.
Claims3
A photomask comprising:
- a first pattern disposed in alignment with a first axis of the photomask;
- at least one second pattern disposed at a distance from, and at a predetermined angle to, the first pattern;
- and
- slits made of Cr on at least one end of each of the first and second patterns,
- wherein the photomask is a Cr-less mask.
2 more elements
Dependencies are inferred from the claim text.