Anti-reflective coating forming composition containing polyamic acid
AssigneeNissan Chemical Industries, Ltd.
InventorsTadashi Hatanaka, Tomoyuki Enomoto, Shigeo Kimura
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Abstract
There is provided an anti-reflective coating forming composition for use in a lithography and for forming an anti-reflective coating that can be developed with an alkaline developer for photoresist, and a method for forming photoresist pattern by use of the anti-reflective coating forming composition. Concretely, the composition comprises a polyamic acid produced from a tetracarboxylic dianhydride compound and a diamine compound having at least one carboxyl group, a compound having at least two epoxy groups, and a solvent.
Claims14
An anti-reflective coating forming composition that is capable of being developed with an alkaline developer, the composition comprising:
- a polyamic acid having a structure of formula (1):
- wherein A1 is a tetravalent organic group, and B1 is a trivalent organic group,
- a compound containing at least two epoxy groups in an amount of 5 to 70 mass parts based on 100 mass parts of the polyamic acid, and
- a solvent.
An anti-reflective coating forming composition that is capable of being developed with an alkaline developer, the composition comprising:
- a polyamic acid having a structure of formula (1) and a structure of formula (2):
- wherein A2 is a tetravalent organic group, and B2 is a divalent organic group,
- a compound containing at least two epoxy groups in an amount of 5 to 70 mass parts based on 100 mass parts of the polyamic acid, and
- a solvent.
Dependencies are inferred from the claim text.