Compensation techniques for substrate heating processes

A method of processing a substrate, comprising:

• determining an initial thermal profile of a substrate resulting from a process;
• adjusting a local amount of mass heated per unit area of a component proximate the substrate in response to the initial thermal profile;
• and
• performing the process to create a desired thermal profile on the substrate.

A method of processing a substrate, comprising:

• determining an initial thermal profile of a substrate resulting from a process;
• adjusting a local heat capacity per unit area of a component proximate the substrate in response to the initial thermal profile;
• and
• performing the process to create a desired thermal profile on the substrate.

A method of processing a substrate, comprising:

• determining an initial thermal profile of a substrate resulting from a process;
• controlling the heat provided by an edge ring to the substrate in response to the initial thermal profile to pre-heat the substrate;
• and
• performing the process to create a desired thermal profile on the pre-heated substrate.

A method of processing a substrate, comprising:

• determining an initial thermal profile of a substrate resulting from a process;
• adjusting an absorptivity or a reflectivity of a component proximate the substrate in response to the initial thermal profile;
• and
• performing the process to create a desired thermal profile on the substrate.