Exposure apparatus and device manufacturing method

An exposure apparatus configured to expose a substrate to light, the apparatus comprising:

• a stage configured to hold the substrate and to be moved;
• a projection optical system configured to project light from an original plate onto the substrate held by the stage;
• a measurement device configured to measure a position of a surface of the substrate in a direction of an optical axis of the projection optical system;
• and
• a controller configured to concurrently control a scan of the stage in a scanning direction perpendicular to the direction of the optical axis, a measurement of the position of the surface in a shot area on the substrate by the measurement device, a movement of the stage according to the measured position of the surface, and an exposure of the shot area,
• wherein the controller is further configured to
• i) cause the measurement device to measure positions of the surface with respect to a plurality of points on the surface over a plurality of shot areas on the substrate,
• ii) obtain a shape of the surface based on the positions of the surface measured with respect to the plurality of points, and
• iii) cause the stage to be moved based on the obtained shape between an exposure of a first shot area on the substrate and an exposure of a second shot area on the substrate, and the measurement device to measure a position of a surface in the second shot area.