Negative resist composition and method of forming resist pattern
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsJun Iwashita, Ayako Kusaka
Life of this patent
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Abstract
A negative resist composition that includes an alkali-soluble resin component, an acid generator component that generates acid upon exposure, and a cross-linker component, wherein the alkali-soluble resin component is a copolymer that includes a structural unit containing an aliphatic cyclic group having a fluorinated hydroxyalkyl group, and a structural unit derived from an acrylate ester that contains a hydroxyl group-containing aliphatic cyclic group, and the cross-linker component includes an alkylene urea-based cross-linker.
Claims6
A negative resist composition, comprising an alkali-soluble resin component (A), an acid generator component (B) that generates acid upon exposure, and a cross-linker component (C), wherein
- said alkali-soluble resin component (A) is a copolymer (A1) that comprises a structural unit (a1) containing an aliphatic cyclic group having a fluorinated hydroxyalkyl group, and a structural unit (a2) derived from an acrylate ester that contains a hydroxyl group-containing aliphatic cyclic group, and
- said cross-linker component (C) is an alkylene urea-based cross-linker (C1) represented by a general formula (C1-1) shown below:
- [wherein, R1′ and R2′ each represent, independently, a hydroxyl group or a lower alkoxy group;
- R3′ and R4′ each represent, independently, a hydrogen atom, a hydroxyl group, or a lower alkyl group;
- and v represents an integer from 0 to 2].
Dependencies are inferred from the claim text.