Resist composition and method for forming resist pattern
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsYusuke Nakagawa, Shinichi Hidesaka, Kazuhiko Nakayama
Life of this patent
Estimating the term…
Abstract
A resist composition is obtained by dissolving a resin component (A) that exhibits changed alkali solubility under the action of acid, an oxime sulfonate-based acid generator (B), an amine compound (D) containing at least one alkyl group of 5 to 12 carbon atoms, and an organic acid (E), in an organic solvent (C) containing methyl n-amyl ketone, wherein the component (E) is a dibasic acid.
Claims14
A resist composition, comprising a resin component (A) that exhibits changed alkali solubility under action of acid, an oxime sulfonate-based acid generator (B), an amine compound (D) containing at least one alkyl group of 5 to 12 carbon atoms, and an organic acid (E), all dissolved in an organic solvent (C) comprising methyl n-amyl ketone, wherein said component (E) is a dibasic acid.
Dependencies are inferred from the claim text.