Sub-resolution assist features for photolithography with trim ends
AssigneeIntel Corporation
InventorsCharles H. Wallace, Chiou-hung Jang
Life of this patent
Estimating the term…
Abstract
Sub-resolution assist features with trim ends are described for use in photolithography. A photolithography mask with elongated features is synthesized. A sub-resolution assist feature is applied to an end-to-end gap between the elongated features. Trim is applied to the ends of the sub-resolution assist feature, the trim connecting the sub-resolution assist feature to an end of a main feature, the trim having a narrower width than the remaining portion of the sub-resolution assist feature and the synthesized photolithography mask is modified to include the sub-resolution assist feature and trim.
Claims18
A method comprising:
- synthesizing a photolithography mask having elongated features;
- applying a sub-resolution assist feature to an end-to-end gap between the elongated features;
- applying trim to the ends of the sub-resolution assist feature, the trim connecting the sub-resolution assist feature to an end of a main feature, the trim having a narrower width than the remaining portion of the sub-resolution assist feature;
- and
- modifying the synthesized photolithography mask to include the sub-resolution assist feature and trim.
An apparatus comprising a machine-readable medium having instructions which when executed by a machine cause the machine to perform operations comprising:
- synthesizing a photolithography mask having elongated features;
- applying a sub-resolution assist feature to an end-to-end gap between the elongated features;
- applying trim to the ends of the sub-resolution assist feature, the trim connecting the sub-resolution assist feature to an end of a main feature, the trim having a narrower width than the remaining portion of the sub-resolution assist feature;
- and
- modifying the synthesized photolithography mask to include the sub-resolution assist feature and trim.
A mask comprising:
- a first feature and a second feature separated from each other by a gap;
- a sub-resolution assist feature between the first feature and the second feature;
- and
- trim ends bridging the gap between the first and second features and the sub-resolution assist feature, the trim ends contacting the first and second feature and being narrower than the sub-resolution assist feature.
Dependencies are inferred from the claim text.