Solution treatment apparatus and solution treatment method

A solution treatment apparatus in which a substrate holding portion is rotated with a treatment solution being supplied from a treatment solution nozzle onto a substrate held on the substrate holding portion to spread the treatment solution on the substrate, said apparatus comprising:

• a plurality of solution treatment sections, each of said solution treatment sections including:
• a rotatable substrate holding portion;
• a cup body provided to surround a substrate held on said substrate holding portion;
• an exhaust path connected to said cup body;
• an exhaust rate adjustment section provided in said exhaust path;
• and
• an exhaust rate amplification mechanism provided in said exhaust path;
• and
• a common exhaust path, said exhaust path of each of said solution treatment sections connecting said cup body thereof to said common exhaust path,
• wherein said substrate holding portion of each treatment section is set to have a number of rotations corresponding to a state of solution treatment on the substrate,
• wherein said exhaust rate adjustment section of each treatment section is setable to have an opening corresponding to a high-rate of exhaust, a medium-rate of exhaust, and a low-rate of exhaust, such that said exhaust rate of said cup body of each treatment section has a predetermined exhaust rate corresponding to said number of rotations of said substrate holding portion of each treatment section, and
• wherein, if said predetermined exhaust rate cannot be attained for said cup body of each treatment section, said exhaust rate amplification mechanism of each treatment section operates to supplement said shortage of exhaust rate such that the exhaust rate in said cup body has said predetermined exhaust rate.