Organometallic precursor compounds
AssigneePraxair Technology, Inc.
InventorScott Houston Meiere
Life of this patent
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Abstract
This invention relates to organometallic precursor compounds represented by the formula (L)M(L′)2(NO) wherein M is a Group 6 metal, L is a substituted or unsubstituted anionic ligand and L′ is the same or different and is a π acceptor ligand, a process for producing the organometallic precursor compounds, and a method for producing a film, coating or powder from the organometallic precursor compounds.
Claims41
A method for producing a film, coating or powder by decomposing an organometallic precursor compound represented by the formula (RL)Mo(CO)2(NO) wherein L is a substituted cyclopentadienyl ligand and R is an alkyl having from 2 to about 8 carbon atoms or SiMe3;
- thereby producing the film, coating or powder.
A method for producing a film, coating or powder by decomposing an organometallic precursor compound represented by the formula (RL)M(L′)2(NO) wherein M is a Group 6 metal, L is a substituted cyclopentadienyl ligand, L′ is the same or different and is a π acceptor ligand, and R is an alkyl having from 2 to about 8 carbon atoms or SiMe3;
- thereby producing the film, coating or powder.
A method for producing a film, coating or powder by decomposing an organometallic precursor compound represented by the formula (RL)M(CO)2(NO) wherein M is a Group 6 metal, L is a substituted cyclopentadienyl ligand and R is an alkyl having from 2 to about 8 carbon atoms or SiMe3;
- thereby producing the film, coating or powder.
A method for producing a film, coating or powder by decomposing an organometallic precursor compound represented by the formula (L)M(L′)2(NO) wherein M is a Group 6 metal, L is a substituted or unsubstituted anionic ligand selected from a diketonate, amide, cyclic amide, alkoxide, halide or imide, and L′ is the same or different and is a π acceptor ligand;
- thereby producing the film, coating or powder.
A method for producing a film, coating or powder by decomposing an organometallic precursor compound represented by the formula (L)Mo(L′)2(NO) wherein L is a substituted or unsubstituted anionic ligand selected from a diketonate, amide, cyclic amide, alkoxide, halide or imide, and L′ is the same or different and is a π acceptor ligand;
- thereby producing the film, coating or powder.
Dependencies are inferred from the claim text.