X-ray metrology with diffractors
AssigneeKLA-Tencor Technologies Corporation
InventorJeffrey A. Moore
Life of this patent
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Abstract
An electron probe microanalysis (EPMA) system includes a graded multilayer diffractor for tightly focusing output x-rays onto an x-ray detector. The graded multilayer construction of the diffractor allows a high x-ray flux to be generated in a small measurement spot, which results in a high measurement throughput. The enhanced measurement efficiency provided by the graded multilayer diffractor can allow an EPMA system to be used as an in-line monitoring tool. The graded multilayer diffractor can include multiple reflecting surfaces. Multiple graded multilayer diffractors can also be used.
Claims15
A method for processing a set of wafers comprising:
- performing a first process on the set of wafers to create a processed set of wafers;
- performing an inline analysis on at least one wafer of the processed set of wafers by focusing output x-rays from the wafer onto an x-ray detector using a graded multilayer diffractor;
- and
- performing a second process on the processed set of wafers after performing the inline analysis.
An x-ray analysis metrology system for analyzing a test sample, the x-ray analysis metrology system comprising:
- a probe beam source for directing a probe beam onto the test sample;
- a graded multilayer diffractor for focusing output x-rays from the test sample;
- and
- an x-ray detector for capturing the focused output x-rays,
- wherein the graded multilayer diffractor facilitates inline analysis of production wafers.
Dependencies are inferred from the claim text.