Exposure apparatus and method for manufacturing device
AssigneeNikon Corporation
InventorHideaki Hara
Life of this patent
Estimating the term…
Abstract
An exposure apparatus wherein an image of a pattern is projected onto a substrate via a projection optical system to expose the substrate, includes: a substrate moving device that is movable while holding the substrate above the projection optical system; and a liquid immersion unit that fills at least a portion of the space between the projection optical system and the substrate with a liquid, wherein the image of the pattern is projected onto the substrate via the projection optical system and the liquid.
Claims49
An exposure apparatus that exposes a substrate via an optical system and a liquid, the exposure apparatus comprising:
- a substrate holding device that holds the substrate above the optical system;
- a liquid immersion unit that fills at least a portion of a space between the optical system and the substrate with the liquid while the substrate is exposed via the optical system and the liquid, the liquid immersion unit including a supply outlet from which the liquid is introduced into the portion of the space and a recovery port from which the liquid is recovered from the portion of the space;
- a liquid trap at which the liquid collects and that prevents leakage of the liquid;
- and
- a flow path that is provided to the liquid trap and recovers the liquid from the liquid trap.
An exposure method that exposes a substrate via an optical system and a liquid, the method comprising:
- holding the substrate above the optical system;
- filling at least a portion of a space between the optical system and the substrate with the liquid, the liquid being introduced into the portion of the space through a supply outlet, and the liquid being recovered from the portion of the space through a recovery port;
- and
- exposing the substrate in a state in which leakage of the liquid from the space between the optical system and the substrate is prevented by a liquid trap at which the liquid collects and to which a flow path is provided to recover the liquid from the liquid trap.
An exposure apparatus that exposes a substrate via an optical system and a liquid, the exposure apparatus comprising:
- means for holding a substrate above the optical system;
- liquid immersion means for filling at least a portion of a space between the optical system and the substrate with the liquid while the substrate is exposed via the optical system and the liquid, the liquid immersion means including a supply outlet from which the liquid is introduced into the portion of the space and a recovery port from which the liquid is recovered from the portion of the space;
- trapping means for preventing leakage of the liquid by collecting the liquid;
- and
- a flow path that is provided to the trapping means and recovers the liquid from the trapping means.
Dependencies are inferred from the claim text.