Substrate holding system and exposure apparatus using the same
AssigneeCanon Kabushiki Kaisha
InventorsAtsushi Ito, Keiji Emoto
Life of this patent
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Abstract
A substrate holding system for holding a substrate based on vacuum attraction and electrostatic attraction including a rim configured to support the substrate, a protrusion for the electrostatic attraction, configured to support the substrate inside the rim, and a protrusion for the vacuum attraction, configured to support the substrate inside the rim. A substrate supporting surface area of the protrusion of the electrostatic attraction is larger than a substrate supporting surface area of the protrusion for the vacuum attraction.
Claims7
A substrate holding system comprising:
- a substrate attracting device including a vacuum-attracting mechanism and an electrostatic-attracting mechanism,
- wherein said substrate attracting device has a substrate supporting surface formed with a ring-like rim and first and second protrusion groups,
- wherein a substrate supporting surface area of each protrusion of said first protrusion group is larger than a substrate supporting surface area of each protrusion of said second protrusion group, and
- wherein a protrusion interval of said first protrusion group is larger than a protrusion interval of said second protrusion group.
An exposure apparatus comprising:
- a substrate holding system configured to hold a substrate to be exposed;
- and
- an exposure device for exposing the substrate,
- wherein said substrate holding system has a substrate attracting device including a vacuum-attracting mechanism and an electrostatic-attracting mechanism,
- wherein said substrate attracting device has a substrate supporting surface formed with a ring-like rim and first and second protrusion groups,
- wherein a substrate supporting surface area of each protrusion of said first protrusion group is larger than a substrate supporting surface area of each protrusion of said second protrusion group, and
- wherein a protrusion interval of said first protrusion group is larger than a protrusion interval of said second protrusion group.
A device manufacturing method comprising the steps of:
- holding a substrate by use of a substrate holding system of an exposure apparatus;
- exposing the substrate by use of the exposure apparatus, while the substrate is being held by the substrate holding system;
- and
- developing the exposed substrate,
- wherein the substrate holding system has a substrate attracting device including a vacuum-attracting mechanism and an electrostatic-attracting mechanism,
- wherein the substrate attracting device has a substrate supporting surface formed with a ring-like rim and first and second protrusion groups,
- wherein a substrate supporting surface area of each protrusion of the first protrusion group is larger than a substrate supporting surface area of each protrusion of the second protrusion group, and
- wherein a protrusion interval of the first protrusion group is larger than a protrusion interval of the second protrusion group.
Dependencies are inferred from the claim text.