Image sensor and manufacturing method of image sensor
AssigneePanasonic Corporation
InventorsHiroshi Sakoh, Hiroshi Okamoto, Ryoichi Nagayoshi
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Abstract
In a manufacturing method of an image sensor, a lightproof film (an antireflective film for avoiding flares) is formed over a wiring area; a transparent film is formed over an imaging area using a material capable of patterning; a transparent film, for forming micro lenses on top, is formed on the transparent film, wherein a height of the top surfaces of the transparent film and the lightproof film are evenly formed.
Claims15
An image sensor including an imaging area having a plurality of pixel units and a wiring area around the imaging area, the image sensor comprising:
- a lightproof film formed over the wiring area;
- a transparent film formed over the imaging area;
- and
- a flat film, on which micro lenses are formed, formed on the transparent film;
- wherein the lightproof film and the transparent film are formed such that a height of a top surface of the transparent film and a height of a top surface of the lightproof film are substantially the same.
An image sensor comprising an imaging area including a plurality of pixel units and a wiring area around the imaging area, the image sensor comprising:
- a semiconductor substrate including photodiodes in the imaging area and wires in the wiring area,
- a flat film, on which micro lenses are formed, the flat film being formed over the imaging area or over both the imaging area and the wiring area;
- and
- a lightproof film formed over the wiring area,
- wherein the lightproof film is formed either on or under the flat film.
Dependencies are inferred from the claim text.