Method and apparatus for processing organosiloxane film

A method for processing an organosiloxane film, the method comprising:

• loading a target substrate with a coating film formed thereon into a reaction chamber, the coating film comprising a polysiloxane base solution having an organic functional group;
• and
• performing a heat process on the target substrate within the reaction chamber to bake the coating film, wherein the heat process comprises:
• a temperature setting step of setting an interior of the reaction chamber at a process temperature by heating, and
• a supplying step of supplying a baking gas into the reaction chamber set at the process temperature, while activating the baking gas by a gas activation section disposed outside the reaction chamber, the gas activation section activating the baking gas by bringing the baking gas into contact with a catalyst while supplying the baking gas with heat energy, wherein:
• the baking gas is selected from the group consisting of ammonia gas and dinitrogen oxide gas,
• the catalyst is tungsten, and
• the gas activation section is configured to heat the baking gas to a temperature of from 700 to 1,000° C.