Substrate temperature regulating support pins

A substrate chamber, comprising:

• a chamber body;
• a substrate support disposed in the chamber body;
• a plurality of support pins disposed in the chamber body and arranged to selectively separate a substrate from the substrate support, wherein at least one of the pins further comprises:
• a male threaded portion at a first end of the pin and engaging the chamber body;
• and
• a female threaded portion formed in the first end of the pin;
• and
• a fluid delivery passage formed through at least one of the support pins.

A substrate chamber, comprising:

• a chamber body;
• a substrate support disposed in the chamber body;
• a plurality of support pins disposed in the chamber body and arranged to selectively separate a substrate from the substrate support;
• a fluid delivery passage formed through at least one of the support pins;
• a first gas delivery line coupled to a first pin of the plurality of support pins;
• a second gas delivery line coupled to a second pin of the plurality of support pins;
• and
• at least one temperature control mechanism configured to control temperature of fluid in the first gas delivery line independently from temperature of fluid in the second gas delivery line.

A method for controlling temperature of a substrate comprising:

• supporting a substrate in a vacuum environment on a plurality of pins;
• delivering a fluid to a surface of the substrate through at least one of the pins, wherein the step of delivering the fluid further comprises:
• delivering a fluid at a first temperature to the surface of the substrate through a first pin;
• and
• delivering a fluid at a second temperature to the surface of the substrate through a second pin.