Cleaning apparatus
AssigneesSanyo Electric Co., Ltd., Giga Tech Inc., Ohkawa & Co., Ltd.
InventorsYoshitaka Kinomura, Teruo Hiraoka, Kojiro Ohkawa
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AssigneesSanyo Electric Co., Ltd., Giga Tech Inc., Ohkawa & Co., Ltd.
InventorsYoshitaka Kinomura, Teruo Hiraoka, Kojiro Ohkawa
Estimating the term…
The cleaning apparatus of the invention includes first and second cleaning tanks cleaning a mask with a predetermined cleaning solution, a vacuum evaporator vacuum-distilling the cleaning solution of the first and second cleaning tanks, a first cooler cooling the vacuum-distilled cleaning solution to room temperature, a first return pipe returning the cleaning solution cooled by the first cooler to the second cleaning tank, first and second rinse tanks rinsing the mask with a predetermined rinse solution, an atmospheric evaporator distilling the rinse solution of the first and second rinse tanks at atmospheric pressure, a second cooler cooling the rinse solution distilled at atmospheric pressure to room temperature, and a second return pipe returning the rinse solution cooled by the second cooler to the second rinse tank.
A cleaning apparatus cleaning a deposition mask used for depositing organic electroluminescent materials, comprising:
Dependencies are inferred from the claim text.