Method and apparatus for improved baffle plate

A baffle plate assembly for surrounding a substrate holder in a plasma processing system comprising:

• a centering ring configured to be coupled to said substrate holder, wherein at least a portion of said centering ring extends radially outside a periphery of said substrate holder;
• and
• a removable baffle plate comprising one or more passageways, wherein said baffle plate is configured to be centered within said plasma processing system by removably coupling said baffle plate to said portion of said centering ring extending radially outside said periphery of said substrate holder, and
• wherein said centering ring is made from aluminum.

A baffle plate assembly for surrounding a substrate holder in a plasma processing system comprising:

• a centering ring configured to be coupled to said substrate holder, wherein at least a portion of said centering ring extends radially outside a periphery of said substrate holder;
• and
• a removable baffle plate comprising one or more passageways, wherein said baffle plate is configured to be centered within said plasma processing system by removably coupling said baffle plate to said portion of said centering ring extending radially outside said periphery of said substrate holder, and
• wherein a surface of said baffle plate comprises a protective barrier.

A baffle plate assembly for surrounding a substrate holder in a plasma processing system comprising:

• a centering ring configured to be coupled to said substrate holder, wherein at least a portion of said centering ring extends radially outside a periphery of said substrate holder;
• and
• a removable baffle plate comprising one or more passageways, wherein said baffle plate is configured to be centered within said plasma processing system by removably coupling said baffle plate to said portion of said centering ring extending radially outside said periphery of said substrate holder, and
• wherein a portion of a surface of said baffle plate comprises a protective barrier.