Method for an automatic optical measuring of an OPC structure
AssigneeMuetec Automatisierte Mikroskopie und Messtecknik GmbH
InventorsHans-Juergen Brueck, Gerd Scheuring
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Abstract
The invention relates to a method for optical measurement of an OPC structure (306), having a pre-determined structure (302) on a photo-mask, in order to determine a measurement of the structure in at least one direction, whereby, firstly, a region (300) is determined on the photo-mask, which comprises the OPC structure (306) to be measured. The intensity of the determined region (300) is then scanned in a first direction and the region in which the intensity passes a threshold is determined for each scan. The maximum separation between an edge (308) of the structure (302) and an edge (312) of the corresponding OPC structure (306) is determined, based on the difference of the determined regions.
Claims6
A method for an optical measuring of an OPC (Optical Proximity Correction) structure associated with a predetermined structure on a photomask, comprising:
- (a) specifying an area on the photomask including the OPC structure to be measured and a first edge of the predetermined structure;
- (b) sampling of an intensity image of the specified area row-wise in a first direction perpendicular to the first edge of the predetermined structure, and for each row:
- (b.1) determining locations in which an intensity passes a threshold, and
- (c) based on the locations specified in step (b.1), determining a location lying farthest out with reference to the predetermined structure, and a location lying farthest in with reference to the predetermined structure;
- and
- (d) determining a maximum distance between the first edge of the predetermined structure and a first edge of the associated OPC structure based on the difference of the location lying farthest out and the location lying farthest in.
Dependencies are inferred from the claim text.