Back to results
US 7,460,231 B2Granted
Alignment tool for a lithographic apparatus
AssigneeASML Netherlands B.V.
InventorsSami Musa, Richard Johannes Franciscus Van Haren, Maurits Van Der Schaar
Life of this patent
Estimating the term…
Abstract
An alignment tool for a lithographic apparatus illuminates an alignment mark on a substrate with an alignment beam and measures the reflected spectrum. The reflected spectrum is compared with a reference mark to determine any misalignment. A blazed sub-wavelength grating is used to deflect the sub-beams created by diffracting the alignment beam from the alignment mark onto the reference mark.
Claims7
An alignment tool comprising:
- at least one reference mark;
- an illuminator configured to direct an alignment radiation beam onto a diffractive alignment mark on a substrate such that the alignment radiation beam is diffracted by the diffractive alignment mark into sub-beams, each sub-beam having a different diffraction order;
- a deflection element configured to deflect the sub-beams from the alignment mark to the at least one reference mark according to the diffraction order of the sub-beams, wherein the at least one reference mark is configured to further diffract the sub-beams such that each sub-beam comprises an indication of a position of the alignment mark with respect to said at least one reference mark;
- and
- a detector configured to inspect the sub-beams diffracted from said at least one reference mark in order to determine the position of the alignment mark with respect to the at least one reference mark, wherein the deflection element comprises a sub-wavelength grating of structures, wherein a distance between adjacent structures is less than the wavelength of the sub-beams.
2 more elements
An inspection method for inspecting an alignment of a pattern on a substrate, comprising:
- illuminating an alignment mark on the substrate with an alignment radiation beam such that the alignment radiation beam is diffracted into sub-beams having different diffraction orders;
- directing the sub-beams onto a deflection element comprising a sub-wavelength grating, the sub-wavelength grating having a period less than a wavelength of the sub-beams, such that the sub-beams are deflected onto at least one diffractive reference mark according to a diffraction order of the sub-beam, wherein the sub-beams are further diffracted by the at least one reference mark such that the sub-beams contain an indication of the position of the alignment mark relative to the at least one reference mark;
- and
- inspecting the sub-beams diffracted by the at least one reference mark in order to determine alignment between the alignment mark and the at least one reference mark.
1 more element
Dependencies are inferred from the claim text.