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US 7,460,208 B2Granted
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsArno Jan Bleeker, Dominicus Jacobus Petrus Adrianus Franken, Martinus Hendricus Hendricus Hoeks, Lambertus Gerardus Maria Kessels, Tobrjörn Sandström
Life of this patent
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Abstract
A lithographic apparatus provided with an array of individually controllable elements that is detachably mounted to mounting points on a support frame of the lithographic apparatus.
Claims38
A lithographic apparatus, comprising:
- a support frame having a mounting point;
- first and second rows each including arrays of individually controllable elements configured to be used to modulate respective corresponding portions of a beam of radiation;
- and
- a position sensor configured to measure a position of a first one of the arrays of individually controllable elements relative to at least a second one of the arrays of individually controllable elements of at least the first row within the apparatus.
1 more element
A lithographic apparatus, comprising:
- a support frame having a mounting point;
- a row including an array of individually controllable elements configured to be used to modulate a beam of radiation;
- an actuator system that is associated with the array of individually controllable elements and that is configured to control the position of the array of individually controllable elements relative to the support frame;
- a balance mass;
- and
- an associated balance mass actuator,
- wherein the balance mass and the associated balance mass actuator provide to the support frame a force that is equal and opposite to the force applied to the support frame by the actuator system.
4 more elements
A lithographic apparatus, comprising:
- a support frame having a plurality of mounting points;
- a plurality of rows each including arrays of individually controllable elements;
- a common reference frame;
- and
- a position sensor configured to measure a position of each of the plurality of arrays of individually controllable elements relative to the common reference frame,
- wherein the position of at least one other component in the lithographic apparatus is measured relative to the common reference frame, and
- wherein the position sensor measures a position of a first one of the plurality of the arrays of individually controllable elements relative to at least a second one of the plurality of the arrays of individually controllable elements within the apparatus.
4 more elements
Dependencies are inferred from the claim text.