US 7,460,206 B2 · Projection objective for immersion lithography

Abstract

In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.

Claims3

Dependent claims

A projection objective for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective, the projection objective comprising:

an optical element, comprising:
a transparent substrate;
and
at least one barrier layer comprising a perfluorinated hydrocarbon supported by the transparent substrate;
and
an immersion medium arranged between the optical element of the projection objective and the image plane,
wherein the at least one barrier layer is in contact with the immersion medium and is capable of reducing degradation of the transparent substrate caused by the immersion medium.

4 more elements

Dependencies are inferred from the claim text.

Facts

Application

11/015,553Filed 20 Dec 2004 · us provisional application

Priority

DE 10 2004 051 73022 Oct 2004

Published

US 2005/0225737 A113 Oct 2005

Granted

2 Dec 2008

Term ends

Not estimatedThe source records don’t support an estimate.

Classification3 codes

G03F 7/70983
Construction of apparatus, e.g. environment aspects, hygiene aspects or materials: optical system protection, e.g. pellicles or removable covers…
G03F 7/70341
Mask projection systems: details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
G03F
Photomechanical production of textured or patterned surfaces

Family

Application60/530,623Us provisional application · filed 19 Dec 2003

Application60/530,978Us provisional application · filed 22 Dec 2003

Application60/544,967Us provisional application · filed 13 Feb 2004

Application60/568,006Us provisional application · filed 4 May 2004

Application60/591,775Us provisional application · filed 27 Jul 2004

Application60/592,208Us provisional application · filed 29 Jul 2004

Application60/612,823Us provisional application · filed 24 Sep 2004

US 2005/0225737 A1Pre-grant publication · published 13 Oct 2005

US 7,460,206 B2This patent

From the US filing history. Foreign family members aren’t listed.

Projection objective for immersion lithography

Life of this patent

Projection objective for immersion lithography

Life of this patent

Abstract

Claims3