Electro-optical device, method for manufacturing electro-optical device, and electronic apparatus

A method for manufacturing an electro-optical device including a substrate having a display region, comprising:

• forming a plurality of display thin-film transistors and a plurality of connection terminals, the display thin-film transistors each including a first electrode disposed in the display region, a portion of a first insulating layer located on the side opposite to the substrate with the first electrode disposed therebetween, a second electrode located on the side opposite to the substrate with the first insulating layer disposed therebetween, and a second insulating layer located on the side opposite to the substrate with the second electrode disposed therebetween, the connection terminals each including a first metal layer which is disposed on a protruding section extending from the display region, which is located at the same level as that of the first electrode, and which is made of the same metal as that of the first electrode, a second metal layer which is located at the same level as that of the second electrode, and which is made of the same metal as that of the second electrode, and which partly overlaps with the first metal layer in plan view, and a portion of the first insulating layer;
• and
• mounting a semiconductor integrated circuit chip, including a plurality of output bumps each electrically connected to the corresponding connection terminals, on the protruding section,
• wherein the first insulating layer extends between the first and second metal layers.