Back to results
US 7,459,710 B2Granted
Lithographic apparatus, method for calibrating and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsJohannes Jacobus Matheus Baselmans, Arno Jan Bleeker
Life of this patent
Estimating the term…
Abstract
To calibrate a lithographic apparatus having a programmable patterning means, a sensor, such as a CCD, CMOS sensor or photo-diode array, having detector elements larger than the size of a spot corresponding to a single pixel of the programmable patterning means is used. Pixels are selectively activated singly or in groups.
Claims5
A method of calibrating a lithographic apparatus, comprising:
- (a) patterning a beam using an array of individually controllable elements;
- (b) directing the patterned beam towards a substrate using a projection system;
- (c) locating a detector having detector elements in a path of the patterned beam, each of the detector elements being larger than a spot corresponding to a single element of the array of individually controllable elements;
- (d) selectively activating the detector elements;
- (e) measuring an amount of radiation received on respective ones of the detector elements from the patterned beam;
- and
- (f) calibrating elements of the array of individually controllable elements based on the measuring step (e),
- wherein,
- step (d) comprises activating elements in the array of individually controllable elements during a measurement interval in step (e) so that only one of the elements of the array of individually controllable elements corresponding to a respective one of the detector elements is activated,
- steps (d) and (e) are repeated with a different one of the elements in the array of individually controllable elements corresponding to a respective one of the detector elements being activated, and
- the detector is moved relative to the patterned beam between repeats of steps (d) and (e).
8 more elements
A method, comprising:
- (a) patterning a beam using an array of individually controllable elements;
- (b) projecting the patterned beam towards a substrate;
- (c) locating a detector having detector elements in a path of the patterned beam, each of the detector elements being larger than a spot corresponding to a single element of the array of individually controllable elements;
- (d) activating a detector element;
- (e) activating a single element in the array of individually controllable elements that corresponds to the activated detector element;
- (f) measuring an amount of radiation received on the activated detector element from the patterned beam;
- and
- (g) calibrating elements of the array of individually controllable elements based on the measuring step (f),
- wherein,
- steps (e) and (f) are repeated after a different one of the elements in the array of individually controllable elements is activated, and
- the detector is moved relative to the patterned beam between repeats of steps (e) and (f).
8 more elements
Dependencies are inferred from the claim text.